C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 471/04 (2006.01) A61K 31/435 (2006.01) A61K 31/495 (2006.01) A61K 31/53 (2006.01)
Patent
CA 2089569
Abstract Compounds of formula I are described Image I, in which R3 represents a C6-12-aryl or hetaryl radical, optionally substituted singly or multiply with C1-4-alkyl, C3-7-cycloalkyl, halogen, C1-4-alkoxy-C1-2-alkyl, phenyl or amino, the process for their production and their use in pharmaceutical agents.
Huth Andreas
Schmiechen Ralph
Schneider Herbert
Seidelmann Dieter
Turski Lechoslaw
Marks & Clerk
Schering Aktiengesellschaft
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