C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/100, 167/187
C07D 501/16 (2006.01) A61K 31/545 (2006.01) C07D 501/00 (2006.01) C07D 501/18 (2006.01) C07D 501/26 (2006.01) C07D 501/28 (2006.01) C07D 501/30 (2006.01) C07D 501/32 (2006.01) C07D 501/34 (2006.01) C07D 501/57 (2006.01)
Patent
CA 2000272
ABSTRACT OF THE DISCLOSURE Compounds of formula (I): Image (I) [in which: R1 is hydrogen or acyl; R2 is hydrogen or C1 - C4 alkoxy; and Ar is phenyl or substituted phenyl] and pharmaceutically acceptable salts and esters thereof have valuable antibiotic activity, including against Methicillin-resistant strains of Staphylococcus. The invention also provides a process for preparing the compounds and methods and compositions using them.
Amemiya Shigeo
Iwata Masayuki
Kojima Koichi
Koyama Kazuo
Marks & Clerk
Sankyo Company Limited
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