C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/322, 260/280
C07D 207/38 (2006.01) C07D 403/06 (2006.01)
Patent
CA 1094083
A B S T R A C T There is disclosed compounds of the formula: Image (I) wherein R is a saturated or unsaturated, straight-chain or branched aliphatic hydrocarbon radical containing up to 6 carbon atoms or is an -Alk-Ar radical. wherein Alk is an alkylene chain containing up to 3 carbon atoms and Ar is a phenyl or heteroaryl radical optionally substituted by halogen atoms and/or lower alkoxy radicals. The novel compounds are useful in the preparation of pharamcol?cally effective compound by substitution of the 3-hydroxyl group.
284653
Hechtfischer Gustav
Herrmann Manfred
Satzinger Gerhard
Goudreau Gage & Associates
Warner-Lambert Company
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