C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/185, 260/235
C07D 498/18 (2006.01) A61K 31/535 (2006.01) C07D 519/00 (2006.01)
Patent
CA 1304363
Abstract of the Disclosure A rifamycin derivative having the formula (I): Image (I) wherein A is a agroup having the formula: Image in which R1 is an alkyl group having 4 or 5 carbon atoms or an alkenyl group having 3 to 5 carbon atoms, or a group having the formula: Image in which n is 3 or 4; or a pharmaceutically acceptable salt thereof. The rifamycin derivative (I) exhibits a strong antibacterial activity against Gram-positive bacteria and acid-fast bacteria, and also exhibits a strong antibacterial activity against tubercle bacilli.
611309
Hashizume Takuji
Hosoe Kazunori
Kuze Fumiyuki
Watanabe Kiyoshi
Yamane Takehiko
Kanegafuchi Kagaku Kogyo Kabushiki Kaisha
Osler Hoskin & Harcourt Llp
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