C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 261/06 (2006.01) A01N 43/80 (2006.01) A01N 53/00 (2006.01) C07D 261/08 (2006.01) C07D 413/12 (2006.01)
Patent
CA 2042420
O.Z. 0050/41619 Abstract of the Disclosure: 3-Isoxazolylbenzyl esters of the general formulae Ia and Ib Image Image Ia Ib where R is halogen, C1-C4-alkyl, C1-C4-haloalkyl, C1-C4-alkoxy, C1-C4-haloalkoxy, C2-C4-alkenyl, C2-C4-haloalkenyl, C2-C4- alkynyl, C2-C4-haloalkynyl, unsubstituted or substituted phenylethenyl, C3-C8-cycloalkyl, aryl, hetaryl, Image or CONR4R5, R3, R4 and R5 are each hydrogen or C1-C6 alkyl, n is 0, 1 or 2, and the radicals R may be different when n is 2, R1 is halogen or C1-C4-alkyl, R2 is hydrogen, C1-C4-alkyl, C2-C4-alkenyl, C2-C4-alkynyl or cyano and A is the carbonyl radical of an acid component usually found in pyrethroids, are contained in pesticides.
Hofmeister Peter
Kardorff Uwe
Kuenast Christoph
Mueller Stefan
Theobald Hans
Basf Aktiengesellschaft
Robic
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