C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/280, 260/315
C07D 231/16 (2006.01)
Patent
CA 1069515
ABSTRACT OF THE DICLOSURE New 3-nitropyrazole derivatives and their process of preparation are provided of formula (I):- Image (I) in which R1 is a lower alkyl radical, R2 is a hydrogen atom or a lower alkyl radical, R3 is a cyano, carboxyl or lower alkoxy- carbonyl radical or the radical -CO-NR4R5, in which R4 is a hydrogen atom or a hydroxyl, carbamoyl, lower-alkylcarbamoyl, di-lower-alkylcarbamoyl, thiocarbamoyl, ureido, thioureido, hydroxyphenyl or picolyl radical or a lower alkyl, alkenyl or cyclo-lower-alkyl radical optionally substituted by a cyano, hydroxyl, pyrrolidino, piperidino, amino, lower alkylamino, lower dialkylamino or lower acylamino radical and R5 is a hydrogen atom or a lower alkyl radical or R4 and R5 together represent a lower alkylene bridge; and the pharmaceutically acceptable pharmacologically compatible salts thereof, the new derivatives have an anti-microbial action in vivo and particularly in the treatment of urinary infections.
267708
Berger Herbert
Gall Rudi
Stach Kurt K. G.
Thiel Max
Vomel Wolfgang
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