C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/315.3, 260/2
C07D 403/12 (2006.01) C07D 231/16 (2006.01) C07D 295/14 (2006.01)
Patent
CA 1066277
ABSTRACT OF THE DISCLOSURE New 3-nitropyrazole derivatives and their preparation are provided of formula (I):- Image (I), wherein Rl is a lower alkyl or hydroxy-lower-alkyl radical and R2 and R3, which may be the same or different, are lower alkyl radicals or R2 and R3 together represent a 4- or 5-membered alkylene bridge which is optionally interrupted by an oxygen atom or by the grouping Image , in which R is a lower alkyl or hydroxy-lower-alkyl radical; and the pharmacologically com- patible acid addition salts thereof: the new derivatives possess an excellent anti-microbial action, not only in vitro but also in vivo, especially systemically.
252639
Berger Herbert
Gall Rudi
Schaumann Wolfgang
Thiel Max
Vomel Wolfgang
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