3-phenyl-4-cyanopyrrole derivatives and microbicidal...

C - Chemistry – Metallurgy – 07 – D

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167/10.3, 167/6.

C07D 405/04 (2006.01) A01N 43/36 (2006.01) C07D 317/60 (2006.01) C07D 405/14 (2006.01)

Patent

CA 1286293

Abstract of the Disclosure The invention relates to novel 3-phenyl-4-cyanopyrrole derivatives of the general formula Image wherein X has the following meanings: A: hydrogen or CO-R1, wherein R1 is C1-C6alkyl which is unsubsti- tuted or substituted by halogen or C1-C3alkoxy; or is C3-C6- alkenyl, C3-C6alkynyl, or C1-C6alkoxy which is unsubstituted or substituted by halogen or C1-C3alkoxy or is C3-C6alkenyloxy, C3-C6cycloalkyl or tetrahydrofur-2-yl; B: S-R2, wherein R2 is C1-C3haloalkyl; C: CH(Y)R3, wherein R3 is hydrogen or C1-C8haloalkyl and Y is hydroxy, halogen or OC(O)R4, wherein R4 is C1-C8alkyl, C1-C8- haloalkyl, C2-C6alkenyl, tetrahydrofur-2-yl, tetrahydropyran- 2-yl or C1-C6alkoxycarbonyl; D: CH2-Z, wherein Z is one of the groups a) Image or b) Image or c) Image in which formulae each of R5 and R6 independently of the other is hydrogen, C1-C6alkyl which is unsubstituted or substituted by cyano or C1-C6alkoxycarbonyl; or is C3-C6alkenyl, C3-C6alkynyl, C3-C7cycloalkyl, or phenyl which is unsubstituted or substitu- ted by halogen, C1-C6alkyl, C1-C6haloalkyl and/or C1-C6alkoxy, with the proviso that only R5 or R6 may be hydrogen; each of R7 and R8 independently of the other is hydrogen, C1-C6alkyl or C1-C6alkoxycarbonyl, or both together form a fused aromatic ring; each of R9 and R10 independently of the other is hydrogen, C1-C6alkyl or C1-C6alkoxycarbonyl; and X is oxygen, sulfur, Image or Image , wherein R11 is hydrogen, C1-C6alkyl, formyl, C1-C6alkanoyl or C1-C6alkoxycarbonyl; and n is 0 or 1. The novel compounds are used for controlling harmful microorganisms, in particular phytopathogenic fungi. They can be employed together with suitable formulation adjuvants as compositions and are also suitable for protecting cultivated plants from attack by harmful microorganisms.

511928

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