C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 213/30 (2006.01) A01N 43/40 (2006.01) C07D 213/57 (2006.01) C07D 213/89 (2006.01)
Patent
CA 2068688
ABSTRACT OF THE DISCLOSURE: Compounds of the formula Image where R is alkyl or cycloalkyl, X,Y,Z are hydrogen, halogen, alkyl, alkoxy, alkoximino, haloalkyl, cyano, nitro or substituted or unsubstituted phenyl or phenoxy, W is a single bond or one of the groups -CH2-, -CH(CH3)- or -CH2CH2- and n is 0 or 1, and plant-tolerated acid addition salts thereof, and fungicides containing these compounds.
Ammermann Eberhard
Lorenz Gisela
Zierke Thomas
Basf Aktiengesellschaft
Robic
LandOfFree
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