C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/211, 260/276
C07D 471/04 (2006.01) A61K 31/435 (2006.01) A61K 31/535 (2006.01)
Patent
CA 1266049
ABSTRACT OF THE DISCLOSURE Compounds of formula I Image wherein: R1 is hydrogen or a protecting group; R2 is -CH=CR42 or -C=CR4; R4 is hydrogen or halogen; R3 is hydrogen, lower alkyl, or lower alkoxyalkyl; RA is, inter alia, hydrogen , OR7, lower alkyl, which optionally is substituted with aryl, lower alkoxy or NR5R6, R5 and R6 can be the same or different and in each case is hydrogen, lower alkyl or together with the nitrogen atom a 5-6 member ring, which can contain another heteratom, R7 is lower alkyl, optionally substituted aryl or aralkyl, and each compound can contain one or more RA radicals which are not hydrogen, have valuable pharmacological properties.
519907
Huth Andreas
Schmiechen Ralph
Schneider Herbert
Seidelmann Dieter
Stephens David Norman
Marks & Clerk
Schering Aktiengesellschaft
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