C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 215/233 (2006.01) A01N 43/42 (2006.01) A01N 47/06 (2006.01) A01N 53/00 (2006.01) C07D 215/56 (2006.01) C07D 219/06 (2006.01) C07D 405/12 (2006.01) C07D 409/12 (2006.01)
Patent
CA 2020667
A 4-acyloxyquinoline derivative represented by the general formula (I): Image wherein R1 represents a hydrogen atom, a C1-C,8 alkyl, C2-C18 alkenyl, C3-C10 cycloalkyl which may be optionally substituted, phenylloweralkyl, phenoxyloweralkyl, aryl group, a group OR4, where R4 represents a lower alkyl or aryl group, or a grou p Image where X represents an oxygen or a sulphur atom; R2 represents a hydrogen atom, a lower alkyl group or a group -COOR5, where R5 represents a hydrogen atom or a lower alkyl group; R3 represents a hydrogen atom, a C1-C10 alkyl or C2-C10 alkenyl group, provided that R1 does not represent OR4 when R2 is a hydrogen atom and R3 is methyl; R2 and R3 together represent a group (CH2)m, wherein m is 3 or 4, and W represents a hydrogen atom, 1 to 4 halogen atoms, a lower alkyl or lower alkoxy group which may be the same or different and with which the left-hand nucleus is substituted, provided that the compound wherein R1 represents methyl, R2, R3 and W each represent a hydrogen atom is excluded.
Imamura Keiichi
Inouye Shigeharu
Iwata Michiaki
Machinami Tomoya
Minowa Nobuto
Fetherstonhaugh & Co.
Meiji Seika Kabushiki Kaisha
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