4-halogeno-5-(halogenomethyl-phenyl)-oxazole derivatives, a...

Details 4-halogeno-5-(halogenomethyl-phenyl)-oxazole derivatives, a... 4-halogeno-5-(halogenomethyl-phenyl)-oxazole derivatives, a...

C - Chemistry, Metallurgy

07

D

402/1, 260/304,

C07D 263/34 (2006.01) C07D 263/57 (2006.01) C07D 413/00 (2006.01) G03C 1/675 (2006.01) G03C 1/72 (2006.01) G03F 7/004 (2006.01)

Patent

CA 1169071

ABSTRACT OF THE DISCLOSURE This invention relates to a novel- 4-halogeno-5-(halo- genomethyl-phenyl)oxazole derivative; to a radiation-sensitive composition which, as the radiation-sensitive compound, contains a 4-halogeno-5-(halogenomethyl-phenyl)-oxazole derivative; and to a process for the preparation of the novel 4-halogeno-5- (halogenomethyl-phenyl)-oxazole derivatives. The novel 4-halo- geno-5-(halogenomethyl-phenyl)-oxazole derivative has the general formula I Image wherein Hal1 is a halogen atom, Hal2 is a chlorine or bromine atom, m is an integer from 1 to 3, n is an integer from 1 to 4, R1 is a hydrogen atom or a further CH3 mHal2m group and, R2 is a 1-valent or 2-valent, at most tetranuclear aromatic or heteroaromatic radical which may be partially hydrogenated and, at an unsaturated ring carbon atom, is linked, directly or via a chain which contains up to 4 exclusively unsaturated carbon atoms, to the oxasolyl part of the molecule according to the general formula I.

378878

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