C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/292.2
C07D 211/22 (2006.01) C07D 211/18 (2006.01)
Patent
CA 1077942
ABSTRACT OF THE DISCLOSURE New intermediates and their preparation are provided of formula (I):- Image (I) wherein R is a hydrogen or halogen atom or a nitro group or a lower alkyl or alkoxy radical; and the acid addition salts thereof with inorganic and organic acids; the new compounds are useful in the preparation of compounds with pharmaceutical pro- perties, for example, with anti-allergic, and central nervous system-depressing action.
264608
Friebe Walter-Gunar
Stach Kurt K. G.
Thiel Max
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