C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/228, 260/278
C07D 211/58 (2006.01) C07D 211/72 (2006.01) C07D 401/06 (2006.01) C07D 409/06 (2006.01) C07D 413/06 (2006.01) C07D 417/06 (2006.01)
Patent
CA 1334416
Compounds are disclosed of the formula Image where R2 is unsubstituted or substituted phenyl, R3 is lower alkyl lower cycloalkyl or lower alkoxy lower alkyl, and L is selected from a wide variety of groups. This new class of compounds exhibit improved analgesic and anesthetic properties.
580589
Kudzma Linas V.
Severnak Sherry A.
Spencer H. Kenneth
Baxter International Inc.
Gowling Lafleur Henderson Llp
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