C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/277.3, 260/2
C07D 401/12 (2006.01) C07D 211/56 (2006.01) C07D 215/44 (2006.01)
Patent
CA 1096870
- 1 - ABSTRACT OF THE DISCLOSURE The disclosure describes naw 4-aminoquinoline derivatives of general formula Image (IV) and their pharmaceutically acceptable acid addition salts, where X is trifluoromethyl or halogen, Z is hydrogen or a defined substituent and R is a group having one of the formulae Image (V) -NR1-A-NR2R3 (VI) and Image (VII) where R1 is hydrogen or lower alkyl, R2 is lower alkyl, R3 is lower alkyl and A is lower alkylene. The new 4- aminoquinoline derivatives show analgesic activity and, in some cases, anti-inflammatory activity.
310803
Archibald John L.
Boyle John T. A.
Ridout & Maybee Llp
Wyeth (john) & Brother Limited
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