C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/296, 71/8.1,
C07D 213/62 (2006.01) A01N 43/40 (2006.01) C07D 213/68 (2006.01) C07D 213/70 (2006.01)
Patent
CA 1313877
ABSTRACT OF THE DISCLOSURE Disclosed are compounds of the formula: Image wherein R1 is a C1-C2 alkyl group; R2 is a hydrogen atom, halogen atom, methyl group, or trifluoromethyl group at the o- or m- position; R3 is a halogen atom, methyl group, or trifluoromethyl group; and X is an oxygen or sulfur atom. These compounds have outstanding herbicidal effects and selectivity for crop plants and weeds. They are useful as herbicides.
545354
Hamada Tatsuhiro
Kawamura Shinichi
Sanemitsu Yuzuru
Yoshida Ryo
Borden Ladner Gervais Llp
Sumitomo Chemical Company Limited
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