C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/304, 260/313
C07D 413/06 (2006.01) A01N 43/80 (2006.01) C07D 249/08 (2006.01) C07D 413/14 (2006.01) C07D 521/00 (2006.01)
Patent
CA 2040940
O.Z. 0050/41566 Abstract of the Disclosure: 5-(1,2,4-Triazol-1-yl- methyl)-isoxazolines I Image I where R1 and R2 are each H, alkoxyalkyl, haloalkyl, alkyl, cycloalkylalkyl, phenylalkyl, naphthylalkyl, cycloalkyl, phenyl, naphthyl or hetaryl, where the aryl and hetaryl moieties of the stated substituents may furthermore carry an unsubstituted or halogen-substituted phenyl or phenoxy radical or up to 3 of the following radicals: halogen, CN, NO2, alkyl, haloalkyl or alkoxy, and the salts and metal complexes of I are suitable as fungicides and for regulating plant growth.
Ammermann Eberhard
Frank Juergen
Kuekenhoehner Thomas
Lorenz Gisela
Zierke Thomas
Basf Aktiengesellschaft
Robic
LandOfFree
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