C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/391, 260/277
C07D 215/22 (2006.01) C07D 215/26 (2006.01) C07D 215/32 (2006.01)
Patent
CA 1081232
ABSTRACT OF THE DISCLOSURE Carbostyril derivatives represented by the formula (I) Image (I) wherein R1 represents a hydrogen atom, an alkyl group or a phenylalkyl group, R2 represents a hydrogen atom, an alkyl group, a phenylalkyl group, an alkenyl group, an alkoxyalkyl group, a hydroxyalkyl group, a carboxyalkyl group, an alkyl- carbonyl group, a cycloalkylcarbonyl group, an alkylcarbonyl- alkyl group, an alkoxycarbonylalkyl group, an alkynyl group or a carbamoylalkyl group, R3 and R4, which may be the same or different, each represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxyalkyl group, an alkenyl group, a phenylalkyl group, a phenoxyalkyl group, a heterocyclic alkyl group or a phenyl group, or R3 and R4 can form, when taken together with the nitrogen atom to which they are attached, a 5- or 6-membered heterocyclic ring which may contain a nitrogen atom or an oxygen atom as an additional hetero atom, the 3,4-bond of the carbostyril nucleus represents a single or double bond, with the proviso that, when one of R3 and R4 represents a hydrogen atom and the other represents an alkyl group, and R1 represents a hydrogen atom, then R2 cannot be a hydrogen atom, an alkyl group or a phenylalkyl group having no substituents on the phenyl moiety thereof, pharmaceutically acceptable acid addition salts thereof, and process for preparing the same.
274453
Nakagawa Kazuyuki
Tominaga Michiaki
Tone Hitoshi
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