C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/226, 260/241
C07D 471/20 (2006.01) A61K 31/47 (2006.01) A61K 31/55 (2006.01)
Patent
CA 2020769
- 1 - HOE 89/S 018 ABSTRACT There are disclosed compounds having the formula Image (I) where n is 0, 1,or 2; p and q are each independently 1, 2 or 3; each X and each Y are independently hydrogen, loweralkyl, loweralkoxy, halogen, hydroxy, nitro, amino, loweralkylamino, diloweralkylamino, trifluoromethyl or loweralkylthio; R1 and R2 are each independently hydrogen or loweralkyl; and R3 is hydrogen, loweralkyl, loweralkylcarbonyl, arylloweralkyl or aminocarbonyl; which are useful as analgesic, antipsychotic and anticonvulsant agents, and a process for their preparation.
Helsley Grover C.
Shoger Kirk D.
Tegeler John J.
Bereskin & Parr
Helsley Grover C.
Hoechst-Roussel Pharmaceuticals Inc.
Shoger Kirk D.
Tegeler John J.
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