C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 311/08 (2006.01) C07D 295/15 (2006.01)
Patent
CA 2156303
The present compounds represented by the formula: Image (wherein R1 is a phenyl group, a halophenyl group or a cycloalkyl group having 3 to 8 carbon atoms, R2 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, R3 is a hydrogen atom, an alkyl group having 1 to 7 carbon atoms, a cycloalkyl group having 3 to 8 carbon atoms, an alkenyl group having 3 to 5 carbon atoms or a benzyl group, or R2 and R3 are bonded together to form a 5- to 7-membered heterocycle) and salts thereof have potent anti-inflammatory, antipyretic, analgesic and anti-allergic actions with less side effects such as gastrointestinal disorders and with such a high safety as to permit long-term administration.
Hatayama Katsuo
Kashiwa Mariko
Saito Shiuji
Shimazaki Yohichi
Yoshikawa Kensei
Mccarthy Tetrault Llp
Taisho Pharmaceutical Co. Ltd.
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