C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
400/7081, 260/31
C07D 249/20 (2006.01) C08K 5/3475 (2006.01) C09B 29/01 (2006.01) C09D 7/12 (2006.01)
Patent
CA 1274527
5-HIGHER ALKYL SUBSTITUTED-2H-BENZOTRIAZOLES AND STABILIZED COMPOSITIONS ABSTRACT OF THE DISCLOSURE 5-Higher alkyl substituted 2-hydroxyphenyl-2H-benzotriazoles of the formula I Image (I) wherein T1 is alkyl of 8 to 18 carbon atoms, and T2 and T3 are independently hydrogen, hydroxyl, alkyl of 8 to 18 carbon atoms or a group of formula II Image (II) wherein E1 and E2 are independently hydrogen or alkyl of 1 to 4 carbon atoms and E3 is hydrogen, halogen or alkyl of 1 to 4 carbon atoms, T4 is hydrogen or hydroxyl, with the proviso that T2, T3 and T4 cannot each be hydrogen at the same time, and that only one of T2, T3 and T4 can be hydroxyl at the same time are disclosed. These compounds are useful for protecting organic substrates from light-induced deterioration.
517154
Seltzer Raymond
Winter Roland A.e.
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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