C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 211/56 (2006.01) A61K 31/451 (2006.01) A61K 31/454 (2006.01) A61P 1/00 (2006.01) A61P 1/08 (2006.01) A61P 9/00 (2006.01) A61P 11/14 (2006.01) A61P 13/02 (2006.01) A61P 17/04 (2006.01) A61P 25/00 (2006.01) A61P 25/04 (2006.01) A61P 25/06 (2006.01) A61P 29/00 (2006.01) A61P 37/02 (2006.01) A61P 37/08 (2006.01) C07C 47/575 (2006.01) C07D 401/06 (2006.01) C07D 401/12 (2006.01)
Patent
CA 2422613
5-Phenylbenzylamine compounds of the general formula (1) or their pharmacologically acceptable salts; a process for preparing the same; and intermediates for their preparation, wherein A is substituted phenyl; Ra, Rb1, and Rb2 are each hydrogen, halogeno, lower alkyl, halogenated lower alkyl, or lower alkoxy; Rc1 is hydrogen, lower alkyl which may be substituted with a heterocyclic group, or acyl; R2c and Re are each hydrogen or lower alkyl; Rd is hydrogen, lower alkyl, or acyl; and Rf is lower alkyl or lower cycloalkyl.
L'invention concerne des composés de 5-phénylbenzylamine représentés par la formule générale (1), y compris leurs sels pharmaceutiquement acceptables, un procédé relatif à leur élaboration, et des intermédiaires pour la synthèse de ces composés. Dans ladite formule, A est phényle substitué; R?a¿, R?b1¿ et R?b2¿ sont chacun hydrogène, halogéno, alkyle inférieur, alkyle inférieur halogéné, ou alcoxy inférieur; R?c1¿ est hydrogène, alkyle inférieur pouvant être substitué par un groupe hétérocyclique, ou acyle; R?2c¿ et R?e ¿sont chacun hydrogène ou alkyle inférieur; R?d ¿est hydrogène, alkyle inférieur, ou acyle; et R?f¿ est alkyle inférieur ou cycloalkyle inférieur.
Asai Hidetoshi
Miyake Tsutomu
Saito Akira
Takahashi Masami
Yamakita Hirokazu
Sim & Mcburney
Tanabe Seiyaku Co. Ltd.
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