C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/289, 260/289
C07D 217/02 (2006.01)
Patent
CA 1296012
ABSTRACT The compound having the formula: Image wherein R is a straight chain, branched chain or cyclic lower alkyl, a lower alkenyl or a lower alkynyl group which may be substituted by a carboxyl group, and R1 is hydrogen atom or an acetyl group; or a pharmaceutically acceptable salt, physiologically hydrolyzable ester or solvate thereof, processes for the preparation thereof, and an antibacterial agent containing it. Also disclosed are a compound having the formula: Image wherein R6 is a hydrogen atom or an alkanoyl group, or a salt thereof and a process thereof.
532358
Nakagawa Susumu
Otake Norikazu
Ushijima Ryosuke
Banyu Pharmaceutical Co. Ltd.
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