C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/111, 167/188
C07D 499/64 (2006.01) A23K 1/17 (2006.01) C07D 499/00 (2006.01)
Patent
CA 1206147
ABSTRACT OF THE DISCLOSURE Compounds of general formula I Image (I) or its lactam tautomer typically, A represents a phenyl, p-hydroxyphenyl, or 2- or 3-thienyl group, R represents a cyclopropyl group, or a group of general formula -NH-R1, [wherein R1 represents a hydrocarbon group; a cycloalkyl group or a 3-pyridyl, 2-furylmethyl, 2-thienylmethyl, 3-imidazolyl- methyl, 2-thiazolylmethyl or 3-pyridylmethyl group; or a group of general formula Image wherein n is 0 or 1, and R2 and R3, which may be the same or different each represents a hydrogen atom or aminosulphonyl, or a substituted aminosulphonyl and salts thereof with bases. These compounds possess valuable pharmacological properties, in particular an antibacterial activity effective against gram- positive and gram-negative bacteria such as, for example .beta.-lactamase-carrying Escherichia coli and Klebsiella pneumoniae.
410580
Eberlein Wolfgang
Goeth Hanns
Lechner Uwe
Maier Roland
Reuter Wolfgang
Fetherstonhaugh & Co.
Thomae (dr. Karl) Gesellschaft Mit Beschrankter Haftung
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