C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 487/06 (2006.01) A61K 31/55 (2006.01) C07D 209/10 (2006.01) C07D 209/42 (2006.01)
Patent
CA 2075102
Abstract of the Disclosure Pharmacologically active compounds corresponding to the general formula I Image I in which R1 represents hydrogen, a lower alkyl or cycloalkyl- alkyl group or an optionally substituted phenyl- lower alkyl group, R2 denotes hydrogen or a lower alkyl group optionally substituted in the .alpha.-position to the nitrogen atom by lower alkoxy, R3 denotes hydrogen, lower alkyl, lower alkoxy, halogen or hydroxyl, n represents 1 or, if the -(CH2)n- chain is in the 4- position of the ring structure, also represents 2, R4 denotes hydrogen, lower alkyl, cycloalkyl, cyclo- alkyl-lower alkyl or an optionally substituted phenyl-lower alkyl group, and R5 denotes hydrogen, lower alkyl, cycloalkyl, cyclo- alkyl-lower alkyl or an optionally substituted phenyl-lower alkyl group, or R4 and R5, together with the nitrogen atom to which they are bonded, form a heterocycle and D represents a bond, or, if R4 and R5 do not denote hydrogen, also represents the -N=CH- group, and their physiologically acceptable acid addition salts are described, and also processes and intermediates for their preparation.
Benson Werner
Gregory Peter C.
Hulkenberg Ton
Preuschoff Ulf
Tulp Martin
Kali-Chemie Pharma Gmbh
Swabey Ogilvy Renault
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