C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/104.5
C07D 501/06 (2006.01) C07D 501/44 (2006.01)
Patent
CA 1049503
Abstract of the Disclosure Cephalosporin derivatives are provided of the formula: Image (IXb) wherein R2 is lower alkyl and R4 is hydrogen, lower alkanoyl- oxy, triazolyl or thiadiazolylthio which is unsubstituted or substituted with lower alkyl, a halo(lower)alkyl ester thereof or non-toxic, pharmaceutically acceptable salts thereof: processes for preparing the novel derivatives are similarly provided. The novel derivatives exhibit a strong antimicrobial activity against a wide variety of microorganisms including gram-negative and gram-positive bacteria; in particular their antibiotic potency is maintained at a high level for a long period of time on oral administration.
204016
Kishimoto Teiji
Nakai Yoshiharu
Takai Keiji
Tanaka Kunihiko
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