C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 471/10 (2006.01) A61K 31/435 (2006.01)
Patent
CA 2226058
The present invention relates to compounds of the formula Image wherein R1 and R2 are, independently from each other, hydrogen, lower alkyl, lower alkoxy or halogen; R3 is phenyl, optionally substituted by lower alkyl,CF3, lower alkoxy or halogen; and R4 is hydrogen, lower alkyl, lower alkenyl, -C(O)-lower alkyl, -C(O)- phenyl, lower alkyl-C(O)-phenyl, lower alkylen-C(O)O-lower alkyl, lower alkantriyl-di-C(O)O-lower alkyl, hydroxy-lower alkyl, lower alkyl-O-lower alkyl, lower alkyl-CH(OH)CF3, phenyl or benzyl, R5 and R6 are, independently from each other, hydrogen, phenyl, lower alkyl or di-lower alkyl or may form together a phenyl ring, and R5 and one of R1 or R2 may form together a saturated or unsaturated 6 membered ring, A is a 4 - 7 membered saturated ring which may contain a heteroatom such as O or S, and to pharmaceutically acceptable acid addition salts thereof which are agonists and/or antagonists of the OFQ receptor.
Adam Geo
Cesura Andrea
Galley Guido
Jenck Francois
Monsma Frederick
F. Hoffmann-La Roche Ag
Gowling Lafleur Henderson Llp
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