C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
400/7087, 31/79,
C07D 401/14 (2006.01) C07D 211/58 (2006.01) C08K 5/3435 (2006.01) C09K 15/30 (2006.01)
Patent
CA 1266272
ABSTRACT The present invention relates to a 2,2,6,6-tetramethyl- piperidine derivative represented by the formula (I), Image (I) wherein R1 and R2 independently represent a hydrogen atom or methyl group, and R3 represents an alkylene group having one to four carbon atoms, its production and use as a stabilizer for synthetic resins. The present invention is particularly useful in preventing photodeterioration of synthetic resins.
453571
Fujii Takeo
Ishii Tamaki
Yachigo Shinichi
Yoshimura Masakatsu
Fujii Takeo
Ishii Tamaki
Ridout & Maybee Llp
Sumitomo Chemical Company Limited
Yachigo Shinichi
LandOfFree
A 2,2,6,6-tetramethylpiperidine derivative, its production... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with A 2,2,6,6-tetramethylpiperidine derivative, its production..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and A 2,2,6,6-tetramethylpiperidine derivative, its production... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1180618