C - Chemistry – Metallurgy – 09 – K
Patent
C - Chemistry, Metallurgy
09
K
C09K 8/80 (2006.01) C04B 38/00 (2006.01)
Patent
CA 2659669
The present invention relates to proppants which can be used to prop open subterranean formation fractions. Proppant formulations are further disclosed which use one or more proppants of the present invention. Methods to prop open subterranean formation fractions are further disclosed. In addition, other uses for the proppants of the present invention are further disclosed, as well as methods of making the proppants.
La présente invention concerne des étais qui peuvent être utilisés pour étayer des parties ouvertes de formation souterraines. L'invention concerne également des formulations d'étai qui utilisent un ou plusieurs étais selon la présente invention. L'invention concerne également des procédés pour étayer des parties de formation souterraines. De plus, l'invention concerne d'autres utilisations des étais de la présente invention, ainsi que des procédés de fabrication des étais.
Barron Andrew R.
Bordia Rajendra
Coker Christopher E.
Costantino Stephen A.
Loscutova John R.
Dimock Stratton Llp
Oxane Materials Inc.
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