A dense plasma focus radiation source

Details A dense plasma focus radiation source A dense plasma focus radiation source

G - Physics

21

G

G21G 4/00 (2006.01) B23K 10/00 (2006.01) G01J 1/00 (2006.01) H05G 2/00 (2006.01) H05H 1/48 (2006.01)

Patent

CA 2499181

The invention pertains to a dense plasma focus radiation source for generating EUV radiation using Lithium vapor and including a coaxially disposed anode (46) and cathode (44). The invention further includes methods and apparatuses for enhancing the efficiency of EUV radiation production, for protecting, cooling and extending the life of the anode (46) and cathode (44), for protecting and shielding collecting optics from debris and pressure disturbances in the discharge chamber (36), and for feeding Lithium into the discharge chamber (36).

Une source de rayonnement de focalisation de plasma dense permet de générer un rayonnement ultraviolet extrême (UV extrême) par l'utilisation de vapeur de lithium, cette source comprenant une anode et une cathode placée de manière coaxiale. La présente invention concerne des procédés et des appareils permettant de renforcer l'efficacité de la production de rayonnement UV extrême, de protéger, de refroidir et d'allonger la durée de vie de l'anode et de la cathode, de protéger des éléments optiques de collecte et d'offrir un écran à ceux-ci contre des débris et des perturbations de pression survenant dans la chambre à décharge et, d'alimenter le lithium dans cette chambre à décharge.

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