G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/20 (2006.01) B23K 26/04 (2006.01) H01L 21/027 (2006.01) H05K 3/00 (2006.01) H05K 3/06 (2006.01)
Patent
CA 2324850
The invention relates to a machine for exposing a panel to laser radiation, said panel having a working length L in a first direction Y, and being subdivided into N successive segments. The machine has a fixed structure; a horizontal panel support that is movable relative to the structure; means (42, 46) for generating and modulating N laser beams; and N optical units (22) which are fixed relative to the structure. Each optical unit has deflector means (50) for generating a continuously deflected beam, and a mirror (62) for directing the deflected beam towards the panel, the length l 1 of the mirror being greater than L/N. The optical units are organized as two sets, with the units in any one set being juxtaposed so that their mirrors (62) are substantially in alignment along the Y direction, the distance in the Y direction between the optical axes of two juxtaposed optical units in the same set being equal to 2L/N and the distance in the Y direction between the optical axis of a unit in one set and the optical axis of an optical unit in the other set that is closest thereto being equal to L/N, thereby enabling the deflected laser beam from one optical unit to scan a length l 1 that is longer than the length of the segment that needs to be scanned.
Boureau Damien
Charbonnier Serge
Automa-Tech
Marks & Clerk
LandOfFree
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