A method and an apparatus for manufacturing an electronic...

G - Physics – 03 – F

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G03F 7/00 (2006.01) B29C 59/02 (2006.01) H01L 51/40 (2006.01)

Patent

CA 2529329

The invention relates to a method for manufacturing an electronic thin-film component and an apparatus implementing the method. The invention also relates to an electronic thin-film component manufactured according to the method. A lowermost, galvanically uniform conductive layer of electrically conductive material is first formed on a substantially dielectric substrate, from which lowermost conductive layer conductive areas are galvanically separated from each other to form an electrode pattern. On top of said electrode pattern it is then possible to form one or several upper passive or active layers required in the thin-film component. According to the invention the separation of said lowermost conductive layer into an electrode pattern takes place by exerting on the lowermost conductive layer a machining operation based on die- cut embossing, i.e. embossing, wherein the relief of the machining member used in the machining operation causes a permanent deformation on the substrate and at the same time embosses areas from the conductive layer into conductive areas galvanically separated from each other. The invention is suitable for manufacturing thin-film components in a roll-to-roll process.

L'invention concerne un procédé pour produire un composant électronique à couches minces, et un appareil pour la mise en oeuvre dudit procédé. L'invention concerne également un composant électronique à couches minces. Ledit procédé consiste à former tout d'abord une couche inférieure conductrice galvaniquement uniforme sur un substrat sensiblement diélectrique, puis à séparer galvaniquement des zones, présentes sur la couche inférieure conductrice uniforme, pour former un motif d'électrode, sur lequel il est ensuite possible de former une ou plusieurs couches supérieures passives ou actives, requises dans ledit composant à couches minces. Selon l'invention, la séparation de ladite couche conductrice inférieure dans le motif d'électrode s'effectue par usinage de cette dernière au moyen d'une opération faisant appel à un estampage-embossage, c'est-à-dire un embossage au cours duquel le relief de la machine d'usinage utilisée provoque une déformation permanente sur le substrat et crée parallèlement un bossage dans les zones de la couche conductrice qui s'imprime dans les zones conductrices séparées galvaniquement les unes des autres. L'invention est appropriée pour la production de composants à couches minces selon un procédé rouleau contre rouleau.

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