A method for plasma treatment under the atmospheric pressure...

C - Chemistry – Metallurgy – 23 – C

Patent

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Details

C23C 16/54 (2006.01) C23C 16/44 (2006.01) C23C 16/50 (2006.01) C23C 16/515 (2006.01) H01J 37/32 (2006.01) H01L 21/205 (2006.01) H01L 21/302 (2006.01) H01L 21/31 (2006.01)

Patent

CA 2435852

A method and a device for atmospheric plasma processing; the method capable of processing a processed body, comprising the steps of, under a pressure near the atmospheric pressure, installing a fixed dielectric on the opposed surface of at least one of a pair of electrodes opposed to each other, leading processing gas between the pair of opposed electrodes, and applying a field between the electrodes to provide plasma, and allowing the plasma to come into contact with the processed body, characterized in that the processed gas is exhausted from near a processed part for allowing the plasma to come into contact with the processed body, and the area near the processed part is held in a specified gas atmosphere by a gas atmosphere conditioning mechanism.

La présente invention concerne un procédé et un dispositif de traitement au plasma atmosphérique; le procédé permettant de traiter un corps préparé comprend, dans des conditions de pression proche de la pression atmosphérique, les étapes consistant à installer un diélectrique fixe sur la surface opposée d'au moins une paire d'électrodes se faisant face; à acheminer un gaz de traitement entre la paire d'électrodes; puis à appliquer un champ entre les électrodes de manière à obtenir du plasma, et à permettre au plasma d'entrer en contact avec le corps préparé. Ledit procédé se caractérise en ce que le gaz de traitement est évacué depuis une zone proche d'une portion traitée de manière à permettre au plasma d'entrer en contact avec ledit corps, puis en ce que la zone proche de la portion traitée est maintenue dans une atmosphère gazeuse spécifiée par un système de conditionnement de l'atmosphère gazeuse.

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