H - Electricity – 01 – J
Patent
H - Electricity
01
J
H01J 49/10 (2006.01) H01J 49/40 (2006.01)
Patent
CA 2241320
A method for producing an ion beam having an increased proportion of analyte ions compared to carrier gas ions is disclosed. Specifically, the method has the step of addition of a charge transfer gas to the carrier analyte combination that accepts charge from the carrier gas ions yet minimally accepts charge from the analyte ions thereby selectively neutralizing the carrier gas ions. Also disclosed is the method as employed in various analytical instruments including an inductively coupled plasma mass spectrometer.
L'invention porte sur un procédé permettant de produire un faisceau ionique comportant une proportion accrue d'ions d'analysat par comparaison aux ions de gaz porteur. Le procédé consiste, plus particulièrement, à ajouter un gaz de transfert de charge à la combinaison porteur - analysat qui accepte une charge provenant d'ions de gaz porteur et accepte malgré tout une charge minimale provenant d'ions d'analysat, ce qui, de ce fait, neutralise les ions de gaz porteur. L'invention porte également sur le procédé tel qu'employé dans divers instruments analytiques comportant un spectromètre de masse à plasma couplé par induction.
Barinaga Charles J.
Eiden Gregory C.
Koppenaal David W.
Battelle Memorial Institute
Fetherstonhaugh & Co.
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