A method for the heat treatment of ii-vi semiconductors

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H01L 21/477 (2006.01) H01L 21/385 (2006.01)

Patent

CA 2227686

An object of the invention is to provide a method for the heat treatment of II-VI semiconductors such as ZnS, ZnSxSe1-x, ZnyCd1-ySe, etc. to dope with Group III elements as a donor impurity to reduce its resistivity. This object can be attained by a method for the heat treatment of II-VI semiconductors in a closed vessel, which comprises forming a film of a Group III element as a donor impurity or a Group III element-containing compound on a surface of single crystal of II-VI semiconductors, then charging the single crystal and a Group II element for constituting the single crystal in the closedvessel and heating them in such a manner that the both are not contacted with each other.

Cette invention a notamment pour fonction de fournir une méthode de traitement thermique pour les semi-conducteurs II-VI tels que ZnS, ZnSxSel-x, ZnyCd1-ySe, etc., afin de les doper d'éléments du Groupe III comme atome donneur dans le but de diminuer leur résistivité. On peut obtenir ce résultat par une méthode de traitement thermique des semi-conducteurs II-VI dans un réceptacle hermétique, qui comprend la formation d'une pellicule d'un élément du Groupe III comme atome donneur ou d'un élément du Groupe III contenant un composé sur la surface d'un monocristal de semi-conducteurs II-VI, et ensuite le chargement du monocristal et d'un élément du Groupe II pour former le monocristal dans un réceptacle hermétique et en les chauffant de manière à ce que les deux éléments ne soient pas en contact l'un avec l'autre.

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