A method for the hybrid integration of discrete elements on...

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H01L 31/02 (2006.01) G02B 6/42 (2006.01) H01L 31/0232 (2006.01) H01L 31/18 (2006.01) G02B 6/12 (2006.01)

Patent

CA 2209548

A method and apparatus is provided for locating with improved vertical positioning accuracy a discrete element on a semiconductor optoelectronic integrated circuit. The method employs an etch stop layer located beneath a series of semiconductor layers. The semiconductor layers may include waveguides to couple light between integrated or discrete elements. Pits with accurate depth are etched in the semiconductor layers down to the etch stop layer. Accurate alignment between a discrete element and another element is made possible by controlling their respective distances from the etch stop layer.

L'invention est constituée par une méthode et un appareil permettant de localiser avec une plus grande précision la position verticale d'un élément discret sur un circuit intégré optoélectronique. La méthode de l'invention utilise une couche de blocage de la gravure placée sous une série de couches semi-conductrices. Celles-ci peuvent comporter des guides de lumière connectant les éléments intégrés ou discrets. Des alvéoles sont formées à des profondeurs déterminées de façon précise dans les couches semi-conductrices jusqu'à la couche de blocage. Il est possible d'aligner avec précision un élément discret et un autre élément en contrôlant les distance de ces éléments par rapport à la couche de blocage.

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