G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/004 (2006.01) C08F 290/04 (2006.01) C09D 4/00 (2006.01) G03F 7/00 (2006.01) G03F 7/027 (2006.01) G03F 7/038 (2006.01) G03F 7/40 (2006.01) H01J 9/20 (2006.01) H01J 9/227 (2006.01) H01J 17/49 (2006.01)
Patent
CA 2197331
To provide a photosensitive paste that permits pattern formation with a high aspect ratio and high accuracy and to provide a plasma display comprising the photosensitive paste, by using a photosensitive paste that comprises, as essential components, inorganic particles and an organic component that contains a photosensitive compound with the difference between the average refractive index of the organic component and the average refractive index of the inorganic particles being 0.1 or less.
Cette pâte photosensible comprend comme composants essentiels un matériau particulaire inorganique et un composant organique qui contient lui-même un composé photosensible. Cette pâte se caractérise en ce que la différence d'indice de réfraction moyen entre ce composant organique et ce matériau particulaire inorganique est maintenue à 0,1 au plus, ce qui permet un traitement de motifs à rapport d'aspect et précision élevés. On décrit aussi un afficheur à plasma pour lequel on recourt à cette pâte.
Iguchi Yuichiro
Iwanaga Keiji
Masaki Takaki
Smart & Biggar
Toray Industries Inc.
LandOfFree
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