A process for fabricating an optical device in a silicon...

Details A process for fabricating an optical device in a silicon... A process for fabricating an optical device in a silicon...

G - Physics

02

B

G02B 6/13 (2006.01) G02B 6/122 (2006.01) G02B 6/12 (2006.01)

Patent

CA 2323683

A process for fabricating a silica-based optical device on a silicon substrate is disclosed. The device has a cladding formed in a silicon substrate. The device also has an active region, and that active region is formed on the cladding. The cladding is fabricated by forming a region of porous silicon in the silicon substrate. The porous silicon is then oxidized and densified. After densification, the active region of the device is formed on the cladding.

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