G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/26 (2006.01) G03F 1/14 (2006.01) G03F 7/20 (2006.01) G03F 9/00 (2006.01) H01L 21/027 (2006.01) H01L 21/31 (2006.01) H05K 3/00 (2006.01)
Patent
CA 2126271
Mask patterns and thire exposure times are stored in a memory within a controller. The controller transfers the mask pattern to a memory in the liquid crystal controller. The mask pattern stored in the memory is displayed on the matrix liquid crystal display element. The controller transfers the next mask pattern to memory after the elapse of exposure time. By this exposure apparatus, a plurality of mask patterns is exposed on a photosensitive material. The exposure time of each portion of the photosensitive material is adjusted in three or more grades by exposing a plurality of mask patterns sequentially. If the photosensitive material is positive, the film thickness becomes low in a portion which has a long exposure time and high in a portion which has a short exposure time. A combination of a plurality of mask patterns enables the section of the photosensitive material to be formed into a desired shape.
Borden Ladner Gervais Llp
Getner Foundation Llc
LandOfFree
A process for forming a photosensitive material and an... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with A process for forming a photosensitive material and an..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and A process for forming a photosensitive material and an... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1631617