A process for resolving, optionally substituted, mandelic...

Details A process for resolving, optionally substituted, mandelic... A process for resolving, optionally substituted, mandelic...

C - Chemistry, Metallurgy

07

C

C07C 51/487 (2006.01) C07C 59/64 (2006.01) C07C 231/20 (2006.01) C07C 237/24 (2006.01)

Patent

CA 2546694

The present invention relates to a new process for the resolution of mandelic acid derivatives from racemic mandelic acid derivative mixtures by salt formation with chiral base cyclic amides; to the resolved mandelic acid cyclic amide salts (see, for example, formula (IIa), as well as certain other metal and amine salts of the mandelic acid derivatives, and to the use of the resolved mandelic acid derivatives as intermediates suitable for large-scale manufacturing of, for example, pharmaceutical compounds; Formula (IIa), wherein R is selected from CHF2, H, C1-6Alkyl, CH2F, CHCl2 and CClF2; and wherein n is 0, 1 or 2; R1 is H or C1-6 Alkyl and X is H, halo or C1-6 Alkyl.

L'invention concerne un nouveau procédé de résolution de dérivés d'acide mandélique provenant de mélange de dérivés d'acide mandélique racémique par formation de sel avec des amides cycliques à base chirale; sur les sels d'amide cyclique d'acide mandélique résolu (voir par exemple, formule (IIa), ainsi que sur certains autres sels de métal et d'amine de dérivés d'acide mandélique, et l'utilisation de dérivés d'acide mandélique résolu en tant qu'intermédiaires servant, par exemple, à la fabrication à grande échelle de composés pharmaceutiques. Dans la formule (IIa), R est choisi parmi CHF¿2?, H, un alkyle en C¿1-6?, CH¿2?F, CHCl¿2? et CClF¿2?; et n prend la valeur de 0, 1 ou 2; R¿1? représente H ou un alkyle en C¿1-6 ?et X représente H, un halo ou un alkyle en C¿1-6?.

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