A silicon substrate having a recess for receiving an...

G - Physics – 02 – B

Patent

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G02B 6/36 (2006.01) G02B 6/42 (2006.01)

Patent

CA 2218751

In a silicon substrate (1) having a recess (2) for receiving an element, at least one holding element (3), integral with the substrate, extends, at least partly, over the recess (2) to hold an element received in the recess (2) in place.

Un substrat de silicium (1), comportant une rainure (2) destinée à réceptionner un élément, se caractérise en ce qu'au moins un élément de retenue (3) intégré s'étend, au moins partiellement, au-dessus de l'évidement (2) afin de retenir un élément réceptionné dans cet évidement (2).

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