Ablative imaging by proximity lithography

Details Ablative imaging by proximity lithography Ablative imaging by proximity lithography

B - Operations, Transporting

41

M

B41M 5/24 (2006.01) B23K 26/06 (2006.01) G03F 7/20 (2006.01) G06K 1/12 (2006.01) G11B 5/596 (2006.01) G11B 5/84 (2006.01) G11B 5/855 (2006.01) H05K 3/00 (2006.01)

Patent

CA 2175678

The present invention includes a method of creating a shaped image (13) in a workpiece (10) using a high energy source (12), with the method comprising positioning a layer (16) proximate the workpiece such that the layer prevents debris from the workpiece from dispersing, and directing radiation from the high energy source through the layer to the workpiece, the layer substantially transparent to radiation emitted by the high energy source such that the high energy source is capable of forming the shaped image.

L'invention concerne un procédé de création d'une image de forme définie (13) dans une pièce à traiter (10) au moyen d'une source d'énergie élevée (12) qui consiste à prévoir une couche (16) à proximité de la pièce à traiter de sorte qu'elle empêche les débris de la pièce de se disperser, et à orienter le rayonnement produit par la source d'énergie élevée sur la pièce à traiter à travers la couche, laquelle laisse passer le rayonnement émis par ladite source d'énergie élevée de sorte que cette dernière forme l'image de forme définie.

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