Abrasive particles for chemical mechanical polishing

Details Abrasive particles for chemical mechanical polishing Abrasive particles for chemical mechanical polishing

C - Chemistry, Metallurgy

09

K

C09K 3/14 (2006.01) C09G 1/02 (2006.01) H01L 21/321 (2006.01)

Patent

CA 2532114

An abrasive composition for polishing substrates including a plurality of abrasive particles having a polydisperse particle size distribution with median particle size, by volume, being about 20 nanometers to about 100 nanometers; a span value, by volume, being greater than or equal to about 20 nanometers, wherein the fraction of particles greater than about 100 nanometers is less than or equal to about 20% by volume of the abrasive particles.

La présente convention concerne une composition abrasive destinée à polir des substrats comprenant une pluralité de particules abrasives qui possèdent une répartition de tailles de particule polydispersées avec une taille de particule moyenne, par volume, comprise entre environ 20 nanomètres et environ 100 nanomètres, un intervalle de mesure, par volume, supérieur ou égal à environ 20 nanomètres, la fraction des particules supérieures à environ 100 nanomètres étant inférieure ou égale à environ 20 % par volume de ces particules abrasives.

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