C - Chemistry – Metallurgy – 08 – K
Patent
C - Chemistry, Metallurgy
08
K
252/31
C08K 5/00 (2006.01) A61F 13/00 (2006.01) A61L 15/60 (2006.01) B01J 20/26 (2006.01) C08J 3/00 (2006.01) C08L 101/00 (2006.01)
Patent
CA 1303008
Abstract of the Disclosure An absorbent composition has an excellent stability and comprises an absorbent resin and 0.01 to 30 percent by weight, based on the dried weight of said absorbent resin, of a radical chain terminator.
544656
Hosokawa Yasunori
Kobayashi Takatoshi
0kao Corporation
Hosokawa Yasunori
Kobayashi Takatoshi
Smart & Biggar
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