H - Electricity – 01 – L
Patent
H - Electricity
01
L
356/192
H01L 21/423 (2006.01) G03F 7/038 (2006.01) G03F 7/20 (2006.01) H01L 21/027 (2006.01)
Patent
CA 1145483
HALL-1 16. ACCELERATED PARTICLE LITHOGRAPHIC PROCESSING AND ARTICLES SO PRODUCED Abstract of the Disclosure Ion beam lithography of particular interest in the fabrication of large-scale integrated circuits of unexpectedly increased throughput results from appropriate choice of (a) resist material and (b) ion species. Resist material, generally negative acting, is characterized by electron beam sensitivity inadequate for ordinary commercial electron beam lithography. The relevant characteristic responsible for inadequate electron beam sensitivity is the very characteristic responsible for enhanced ion sensitivity. Ion species, always of atomic number greater than that of proton, are dictated by the observation that sensitivity unexpectedly increases at a greater rate than predictable on traditional bases.
352644
Hall Thomas M.
Wagner Alfred
Kirby Eades Gale Baker
Western Electric Company Incorporated
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