C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 317/28 (2006.01) A61K 31/16 (2006.01) A61K 31/44 (2006.01) C07C 317/44 (2006.01) C07C 323/41 (2006.01) C07C 323/60 (2006.01) C07D 213/40 (2006.01) C07D 213/52 (2006.01) C07D 213/56 (2006.01)
Patent
CA 2166128
The present invention relates to compounds of formula (I) wherein R1 is selected from H and 3-chloro; R2 is selected from a phenyl group and a pyridyl group; R3 and R4 are selected independently of each other from H and methyl; R5 and R6 are selected independently of each other from H and a pyridyl-methyl group or both represent an ethyl group; n = 0 or 1; R1, R3, R4, R5 and R6 are not simultaneously H when R2 is phenyl. The salts of the compounds having a pyridyl group with pharmaceutical acceptable acids are also disclosed.
La présente invention concerne des composes de formule (I) dans laquelle: R1 est choisi parmi H et 3-chloro, R2 est choisi parmi un groupe phényle et un groupe pyridyle, R3 et R4 sont choisis indépendamment l'un de l'autre parmi H et méthyle, R5 et R6 sont choisis indépendamment l'un de l'autre parmi H et un groupe pyridyl-méthyle ou représentent tous les deux un groupe éthyle, n = 0 ou 1, R1, R3, R4 R5 et R6 n'étant pas simultanément H quand R2 = phényle, et les sels des camposés à groupe pyridyle avec des acides pharmaceutiquement acceptables.
Goudreau Gage Dubuc
Laboratoire L. Lafon
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