C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 271/26 (2006.01) C07C 271/16 (2006.01) C07C 275/24 (2006.01) C07C 275/32 (2006.01) C07C 323/60 (2006.01) C07D 317/54 (2006.01) C07D 317/60 (2006.01) C07D 333/24 (2006.01) C07F 17/02 (2006.01) C08G 69/00 (2006.01) C08G 71/00 (2006.01) C08G 73/00 (2006.01) C08G 75/00 (2006.01) G03C 1/73 (2006.01) G03F 7/004 (2006.01) G03F 7/032 (2006.01) G03F 7/039 (2006.01)
Patent
CA 2066086
Abstract of the Disclosure Compounds having repeating units of the formula I Image (I) in which R1 is an alkylene, cycloalkylene, alkenylene, alkynylene, or arylenebisalkyl group, in which one or more aliphatic CH2 groups may be replaced by oxygen or sulfur atoms, R2 is an alkyl, alkenyl, alkynyl, cycloalkyl, alkoxyalkyl, aryl, aralkyl or aryloxyalkyl radical, R3 is an alkyl or aryl radical, X is -CO-, -O-CO- or -NH-CO-, and n is an integer greater than 1, especially from 3 to 50. are cleavable by acid and, in combination with photolytic acid donors and alkali-soluble binders, are constituents of positive-working mixtures which are used especially in recording materials for UV radiation and high-energy radiation. The materials are distinguished by a high resolution in conjunction with high image contrast.
Dammel Ralph
Pawlowski Georg
Roeschert Horst
Spiess Walter
Dammel Ralph
Fetherstonhaugh & Co.
Hoechst Aktiengesellschaft
Pawlowski Georg
Roeschert Horst
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