Acid deoxidizing/etching composition and process suitable...

C - Chemistry – Metallurgy – 09 – K

Patent

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C09K 13/08 (2006.01) C23F 1/20 (2006.01) C23F 3/03 (2006.01) C23G 1/02 (2006.01) C23G 1/12 (2006.01)

Patent

CA 2248568

A thixotropic aqueous liquid composition suitable for deoxidizing and etching aluminum substrates, even if they are vertical to local gravity and not immersed in any container, contains fluoride ions, an acid with an ionization constant greater than that of HF, a viscosity increasing agent that preferably is a modified xanthan gum, and both anionic and nonionic surfactants. Preferably the composition also contains a colorant, so that the thickness of the coating applied to a substrate may be visually estimated.

Composition liquide aqueuse thixotrope appropriée pour désoxyder et décaper des substrats en aluminium, même si ces derniers sont verticaux par rapport à la gravité locale et non immergés dans des cuves. Ces compositions contiennent des ions fluorure, un acide présentant une constante d'ionisation supérieure à celle d'un acide fluorhydrique, un agent augmentant la viscosité, de préférence sous forme de gomme xanthane, ainsi que des tensioactifs anioniques et non ioniques. Ladite composition contient également de préférence un colorant de sorte que l'épaisseur du revêtement appliqué sur le substrat puisse être évaluée visuellement.

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