Acid-hardening photoresists of improved sensitivity

Details Acid-hardening photoresists of improved sensitivity Acid-hardening photoresists of improved sensitivity

G - Physics

03

F

96/17

G03F 7/038 (2006.01) G03F 7/004 (2006.01)

Patent

CA 2019693

PATENT APPLICATION OF Karen A. Graziano Leonard E. Bogan Robert J. Olsen and Susan E. Anderson FOR ACID-HARDENING PHOTORESISTS OF IMPROVED SENSITIVITY DN 89-05 Abstract of the Disclosure Photoresists are disclosed that display increased sensitivity, measured as lithographic potential, when compared to known photoresists that contain melamine resin as a crosslinker. The melamine resin in these photoresists contains a higher percent by weight of monomeric hexamethoxymethylmelamine than in known resists.

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