Acid-resistant copolymer and photographic element...

Details Acid-resistant copolymer and photographic element... Acid-resistant copolymer and photographic element...

C - Chemistry, Metallurgy

08

F

96/178, 402/497

C08F 118/10 (2006.01) G03C 1/74 (2006.01) G03C 1/71 (1980.01)

Patent

CA 1106544

Abstract A photocrosslinkable polymer and imaging element containing said polymer are described wherein acid resistance is achieved by vinyl ester recurring units. A process for etching an element so prepared features exposure, development, and etching in an acid bath. -1-

364071

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